Dong Xiang, Huanxiong Xia, Wang Yang, Peng Mou.Parametric study and residual gas analysis of large-area silicon-nitride thin-film deposition by plasma-enhanced chemical vapor deposition. Vacuum,2019 172–178
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- Xia, HX; Xiang, D; Mou, P; Yang, W. Experimental study of the effects of showerhead configuration on large-area silicon-nitride thin film by plasma-enhanced chemical vapor deposition.. Thin Solid Films. 2017, Vol. 638: 1-8.